The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[13p-2H-1~21] 6.3 Oxide electronics

Sun. Sep 13, 2015 1:45 PM - 7:15 PM 2H (222)

座長:矢嶋 赳彬(東大),藤原 宏平(東北大)

4:15 PM - 4:30 PM

[13p-2H-11] The improvement of electron mobility in La:BaSnO3 thin films by the insertion of atomically-flat insulating (Sr,Ba)SnO3 buffer layer

〇(M2)KAZUKI NISHIHARA1, JUNICHI SHIOGAI1, ATSUSHI TSUKAZAKI1,2 (1.IMR, Tohoku Univ., 2.PRESTO, JST)

Keywords:transparent conducting thin film,mobility

Recently, BaSnO3 have attracted much attention as the high mobility transparent conducting material. However, it is a problem that electron mobility of BaSnO3 thin films on SrTiO3 substrate is lower than that of single crystals due to the large lattice mismatch (5.5%) with SrTiO3 substrate. In this study, electron mobility in La:BaSnO3 thin films was improved by the insertion of atomically-flat BaSnO3 / (Sr,Ba)SnO3 buffer layer.