The 76th JSAP Autumn Meeting, 2015

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[13p-2Q-1~27] 6.4 Thin films and New materials

Sun. Sep 13, 2015 1:15 PM - 8:30 PM 2Q (231-1)

座長:西川 博昭(近畿大),田中 勝久(京大),名村 今日子(京大),篠田 健太郎(産総研)

1:45 PM - 2:00 PM

[13p-2Q-3] Patterning the graphene using an Electron Beam Lithography Exposure

〇(M2)Takao Izaki1, Hiroshi Kubota1, Seiya Matsukawa1, Hiroki Nishiguchi1, Masaki Yoshitake1, Masao Yoshioka2 (1.Graduate School of Science and Technology Kumamoto Univ, 2.Kumamoto Univ)

Keywords:graphene,electron beam