[14a-1C-1~10] 13.4 Si wafer processing /MEMS/Integration technology

[14a-1C-8] Process Issues in Optical Integrated Circuits using Silicon Photonics Technology (III)
Fabrication of Low-loss Waveguides with Low LER and Clean Surface

〇Tsuyoshi Horikawa^1,2, Daisuke Shimura², Seok-Hwan Jeong², Masatoshi Tokushima², Keizo Kinoshita², Tohru Mogami² (1.AIST, 2.PETRA)

Keywords:silicon photonics,optical waveguides,optical integrated circuits

The fabrication technology for low-loss silicon wire-waveguide was developed for large-scaled optical integrated circuits using silicon photonics technology. The low LER in waveguide pattern fabricated by using high-resolution ArF immersion lithography technology and the clean waveguide surface by eliminating a carbon-containing interface layer were experimentally confirmed. The fabricated silicon wire-waveguides showed quite low propagation loss less than 0.5dB/cm for TE mode at 1.55 μm.