The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[14a-1D-1~11] 15.4 III-V-group nitride crystals

Mon. Sep 14, 2015 8:45 AM - 11:45 AM 1D (141+142)

座長:竹内 哲也(名城大),中野 貴之(静岡大)

9:00 AM - 9:15 AM

[14a-1D-2] Low-temperature (~400 deg. C) growth of InN-based materials by NH3 decomposition catalyst-assisted MOVPE (II): InxGa1-xN(x~0.3) growth

〇Akio Yamamoto1,2, Kazuki Kodama1,2, Naoteru Shigekawa3, Takashi Matsuoka4, Masaaki Kuzuhara1 (1.Univ. of Fukui, 2.JST-CREST, 3.Osaka City Univ., 4.Tohoku Univ)

Keywords:InGaN,MOVPE,ammonia decomposition catalyst

The MOVPE growth of InGaN using a pellet-type NH3 decomposition catalyst has been investigated. By using this method, a single-crystalline wurtzite InGaN is grown at a temperature less than 500 deg. C. A possibility that C contamination level in InGaN grown by this method is markedly reduced is also found.