The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

13 Semiconductors » 13.9 Optical properties and light-emitting devices

[14a-2B-1~10] 13.9 Optical properties and light-emitting devices

Mon. Sep 14, 2015 9:30 AM - 12:15 PM 2B (211-2)

座長:今北 健二(神戸大)

9:30 AM - 9:45 AM

[14a-2B-1] Observation of spin relaxation in Si doped GaAs grown by VGF method

〇shunsuke ohki1, Masaki Asakawa1, Tomoki Ishikawa1, Atsushi Tackeuchi1 (1.Waseda Univ.)

Keywords:spin relaxation,Si doped GaAs,pump and probe measurements

In this research, we investigated the spin relaxation in Si doped GaAs by the VGF method by time-resolved spin-dependent pump and probe reflectance measurements. As a result, the spin relaxation time was 246 ps in 10 K, and negative temperature dependence of the spin relaxation time was observed between 10 and 150 K. Because this result is different from the result of the undoped GaAs by the VGF method which we reported before, I think this research has the important meaning that can contribute to elucidation of the spin relaxation mechanism.