2015年 第76回応用物理学会秋季学術講演会

講演情報

一般セッション(口頭講演)

17 ナノカーボン » 17.1 成長技術

[14a-2T-1~12] 17.1 成長技術

2015年9月14日(月) 09:00 〜 12:15 2T (232)

座長:佐藤 信太郎(富士通研)

09:00 〜 09:15

[14a-2T-1] メタンを用いた気相還元による大面積単層酸化グラフェン膜の形態変化評価

〇(M2)BinDzukarnain MuhammadZikri1、今井 響1、髙見 俊志1、荻野 俊郎1,2 (1.横国大院工、2.CREST/JST)

キーワード:酸化グラフェン、気相還元、電気導電性

By optimizing graphene's unique mechanical, optical and one-atom thickness properties, it exhibits potential application in the area of transparent, flexible electrodes and thin-film devices. Among all graphene fabrication methods, reduction of graphene oxide (GO) is expected as the new potential approach to cost-effivetively produce large-area graphene films for mass production. In this study, by comparing the reduction of large-area monolayer GO films in methane with typical thermal annealing method in only argon atmosphere, we have investigated the morphological changes GO flakes/sheets and its effect on the restoration of GO film conductivity.