[14p-1A-1~6] International Symposium on Thin Film Technologies for Flexible Devices

▲ [14p-1A-1] Reusable Colloidal-based Polymer Photomask for Rapid Nanoscale Patterning

〇Johnny Ho^1,2 (1.Dept of Physics and Materials Science, City University of Hong Kong, Hong Kong, 2.City University of Hong Kong Shenzhen Research Institute, Shenzhen, China)

キーワード：colloidal monolayer,wafer scale nanopatterning,soft photomask

In this presentation, we demonstrate a facile but reliable photolithographic technique, which allows the rapid fabrication of highly ordered nanostructure arrays by employing soft transparent polymer films as optical masks for the area-selective exposure of a photoresist upon flood UV illumination^[1]. The soft polymer film either contains a monolayer of self-assembled (SAM) colloidal spheres inside at the near surface or has one side replicated from a SAM colloidal layer, in which the confined colloidal spheres or the surface textures can serves as lenses for light focusing^[2]. The geometrical feature of the patterns, including the size, pitch, and even the shape, can be finely tuned by adjusting the mask design, exposure time and the thickness of the photoresist layer. Instead of a single usage, the polymer mask can be used numerous times without noticeable distortions in the achieved patterns. The obtained patterns could be used as deposition or etching mask, allowing easy pattern transfer for various applications^[3].
References:
[1] M. Fang, H. Lin, H.Y. Cheung, S.P. Yip, F. Xiu, C.Y. Wong and J.C. Ho: Advanced Optical Materials Vol. 2 (2014), p. 855 [Frontispiece Cover Article]
[2] M. Fang, H. Lin, H.Y. Cheung, F. Xiu, L. Shen, S.P. Yip, E.Y.B. Pun, C.Y. Wong and J.C. Ho: ACS Applied Materials & Interfaces, Vol 6 (2014), p. 60837
[3] H. Lin, F. Xiu, M. Fang, S.P. Yip, H.Y. Cheung, F.Y. Wang, N. Han, K.S. Chan, C.Y. Wong and J.C. Ho: ACS Nano Vol. 8 (2014), p. 3752