The 76th JSAP Autumn Meeting, 2015

Presentation information

Symposium

Symposium » Evaluation technology for oxide semiconductor

[14p-1B-1~9] Evaluation technology for oxide semiconductor

Mon. Sep 14, 2015 1:15 PM - 6:00 PM 1B (133+134)

座長:反保 衆志(産総研),山本 哲也(高知工科大)

4:00 PM - 4:30 PM

[14p-1B-6] Atomic-resolution electronic-structure studies of metal oxides

〇Taro Hitosugi1 (1.Tohoku Univ., AIMR)

Keywords:oxides,scanning tunneling microscope,STM

Transition-metal oxides show a variety of phenomena at their surfaces and interfaces, which have been induced by structural and electronic modifications. Although intensive studies of oxides have provided a fertile new ground for creating novel states at their surfaces and interfaces, the origins of the functionalities, on an atomic scale spatial resolution, remain far from understood. In order to clarify the origins of such phenomena and to further explore intriguing functionalities, it is important to elucidate their electronic structures at the atomic level.
In this presentation, the scanning tunneling microscopy (STM) studies of Si donors in β - Ga2O3 are reported. Atomic-scale electronic structures show different properties depending on the numbers of coordinated oxygen atoms around Si donors. Further, spatial electron distribution on LiCoO2 surface, depending on the atomic arrangement of Li ions, is discussed.