[14p-1C-1~16] 13.4 Si wafer processing /MEMS/Integration technology

[14p-1C-14] In-Situ Observation of thermal behavior in CVD reactor

〇kento miyazaki¹, Ayumi Saito¹, Misako Matsui¹, Hitoshi Habuka¹ (1.Yokohama Nat. Univ)

Keywords:In situ monitor,Langasite crystal microbalance,Thermal condition

The langasite crystal microbalance (LCM) has been used for in-situ obtaining the frequency change due to the weight increase caused by the film deposition, and due to the ambient gas properties. In this study, the method for evaluating the temperature change during the film deposition was developed, taking into account the behaviors of reaction heat by filn deposition and the heat capacity of ambient gas.