15:45 〜 16:00
[14p-2Q-8] 自己形成法を用いた、ナノメートル領域のボトムアップ法とマイクロメートル領域のトップダウン法との架橋技術の構築
キーワード:半導体、ナノワイヤ、自己組織化
This work presents a method that bridges the gap between the nanometer-scale bottom-up and micrometer-scale top-down approaches for site-defined InP/InAs heterostructure NWs, which has long been a significant challenge for applications that require low-cost and high-throughput manufacturing processes.