[15a-PB1-1~16] 9.2 ナノワイヤ・ナノ粒子

▲ [15a-PB1-4] Fabrication of Nanoimprint-SiNW Solar Cells with Optimized p-matrix Coverage

〇Wipakorn Jevasuwan¹, Kiyomi Nakajima¹, Yoshimasa Sugimoto¹, Naoki Fukata¹ (1.NIMS)

キーワード：Nanoimprint,Nanowires,Solar cells

The conical or cylindrical shape of nanowire (NW) structures is favorable for photovoltaic applications owning to many advantages such as increasing of light trapping and junction area. However, NW synthesis methods for large scale fabrication are still being in challenge and their potential application to highly efficient solar cells has been intensively investigated. In this work, 3D-structure solar cell fabrication was achieved using n-Si NWs synthesized by nanoimprint and Bosch process. Solar cell efficiency upon 6% for an active area of 1 cm² was simply optimized by p-Si matrix coverage and two-step H₂ annealing technique. Optimized p-Si matrix coverage enhanced solar cell performances by reducing of contact resistance and increasing of V_oc and I_sc. H₂ annealing reduced defect densities on n-SiNW surface and inside p-Si layer, and improved p-Si crystallinity.