2015年 第76回応用物理学会秋季学術講演会

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一般セッション(ポスター講演)

13 半導体 » 13.6 Semiconductor English Session

[15a-PB5-1~4] 13.6 Semiconductor English Session

2015年9月15日(火) 09:30 〜 11:30 PB5 (白鳥ホール)

09:30 〜 11:30

[15a-PB5-3] Externally applied magnetic field-effects on the terahertz emission
from p-type and n-type InAs wafers

Alexander De Los Reyes1, 〇(B)Elmer Estacio1 (1.National Institute of Physics, University of the Philippines Diliman)

キーワード:Terahertz

We propose a new insight on the origin of the magnetic field enhancement of the terahertz emission in femtosecond laser excited Indium Arsenide (InAs) surfaces. Magnetic field effects on the TeraHertz Time-Domain Spectroscopy (THz-TDS) line-shape were studied for both upward and downward magnetic field orientations using a 650 mT magnet applied parallel to the surface and perpendicular to the reflection plane. A 180 phase-shift was observed in both the p- and n-InAs samples upon reversal of the magnetic field orientation. Furthermore, the magnetic field-enhancement in p-InAs is higher when the magnetic field orientation is upward while the magnetic field-enhancement in n-InAs is higher when the magnetic field orientation is downward. We present these magnetic field enhancement results as a consequence of an increased contribution of the surface field-induced drift surge current which was generally perceived to be non-dominant in InAs [1, 2]. The general effect of the magnetic field aside from the net rotation of the terahertz dipole is to induce cyclotron motion of the photo-electrons, forcing these carriers to spend more time in the surface depletion region rather than simply undergoing transport towards the bulk when there is no magnetic field. We propose this mechanism as a possible enhancement mechanism that may occur simultaneously as an additional enhancement to the widely-accepted mechanism of dipole-reorientation.