[15p-2Q-1~17] 8.7 Plasma phenomena, emerging area of plasmas and their new applications

[15p-2Q-17] Indium Implantation onto Zeolite for Development of Catalysts

〇Satoru Yoshimura¹, Yoshihiro Nishimoto¹, Masato Kiuchi^1,2, Makoto Yasuda¹ (1.Osaka Univ., 2.AIST)

Keywords:Indium,Zeolite

Chemical substances that contain both indium (In) and silicon (Si) in close proximity are known to catalyze certain organic chemical reactions. The implantation of In onto zeolite which includes Si atoms was carried out by a low-energy mass-selected ion beam system and a pulse arc plasma process for the possible development of novel catalysts. The measurement of sample surface of the In implanted zeolite revealed that In was successfully implanted. In addition, the In implanted zeolite by the plasma process was capable of catalyzing an organic chemical reaction (i.e., Friedel-Crafts alkylation).