The 76th JSAP Autumn Meeting, 2015

Presentation information

Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[15p-2V-1~22] 8.1 Plasma production and control

Tue. Sep 15, 2015 1:00 PM - 7:00 PM 2V (234-1(South))

座長:杤久保 文嘉(首都大),三沢 達也(佐賀大)

1:15 PM - 1:30 PM

[15p-2V-2] Comparison between experimental results and computer-simulation for understanding of the Production of Highly Charged Ions with Two Frequencies in Electron Cyclotron Resonance Heating

〇Atsushi Kitagawa1, Racz Richard2, Biri Sandor2, Muramatsu Masayuki1, Kato Yushi3 (1.NIRS, 2.ATOMKI, 3.Osaka Univ.)

Keywords:ion source,ECR heating,highly charged ion

The improvement of the beam intensity for highly charged ions in an electron cyclotron resonance ion source has been studied. In order to understand the effectiveness of multi-frequency microwaves in the electron heating, a comparison between experimental measurements and computer simulations has been carried out.