The 76th JSAP Autumn Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[15p-2V-1~22] 8.1 Plasma production and control

Tue. Sep 15, 2015 1:00 PM - 7:00 PM 2V (234-1(South))

座長:杤久保 文嘉(首都大),三沢 達也(佐賀大)

1:45 PM - 2:00 PM

[15p-2V-4] Producing Fullerene Ion Beam Extracted from the 2nd Stage of Tandem Type ECRIS

〇Tomoki Nagaya1, Takuya Nishiokada1, Shogo Hagino1, Takuro Otsuka1, Takashi Uchida2, Masayuki Muramatsu3, Huminobu Sato1, Atsushi Kitagawa3, Yushi Kato1, Yoshikazu Yoshida2 (1.Osaka Univ., 2.Toyo Univ., 3.NIRS)

Keywords:ECR plasma