The 76th JSAP Autumn Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[15p-2V-1~22] 8.1 Plasma production and control

Tue. Sep 15, 2015 1:00 PM - 7:00 PM 2V (234-1(South))

座長:杤久保 文嘉(首都大),三沢 達也(佐賀大)

2:15 PM - 2:30 PM

[15p-2V-6] Adequate conditions and control ion beam extracted from tandem type ECRIS on He/N/Ar/Xe and Fe/C60 gases

〇takuro otsuka1, Takuya Nishiokada1, Tomoki Nagaya1, Shogo Hagino1, Fuminobu Sato1, Yushi Kato1 (1.Osaka Univ.)

Keywords:ECR plasma