The 76th JSAP Autumn Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[15p-2V-1~22] 8.1 Plasma production and control

Tue. Sep 15, 2015 1:00 PM - 7:00 PM 2V (234-1(South))

座長:杤久保 文嘉(首都大),三沢 達也(佐賀大)

3:15 PM - 3:30 PM

[15p-2V-9] Development of Power Reduction Methods in Microwave Excited Plasma Using Water as Source

〇Takuya Itou1, Takuya Kitano1, Hiroaki Suzuki1, Tatsuo Ishijima1, Yasunori Tanaka1, Yoshihiko Uesugi1, Takashi Nishiyama2, Hideo Horibe2 (1.Kanazawa Univ., 2.Osaka city Univ.)

Keywords:plasma,semiconductor,ashing