The 76th JSAP Autumn Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.2 Applications and technologies of electron beams

[15p-4E-1~23] 7.2 Applications and technologies of electron beams

Tue. Sep 15, 2015 1:15 PM - 7:30 PM 4E (437)

座長:村田 英一(名城大),嶋脇 秀隆(八戸工大)

4:30 PM - 4:45 PM

[15p-4E-13] Dependence of fogging electron by electron beam exposure on the bias-voltage

〇(M1)Masasi Tokai1, Yuki Handa1, Takuya Kawamoto1, Masatoshi Kotera1 (1.Osaka Institute of Technology)

Keywords:SEM,insulator,measurement of surface potential distribution