[15p-PB2-1~53] 8 Plasma Electronics（Poster)

[15p-PB2-27] Effects of Flux direction of Ambient Gas in Reactive Evaporation Process

〇(M1)akihiro nakao¹, yasushi inoue¹, osamu takai² (1.Chiba Inst. Technol, 2.Kanto Gakuin Univ)

Keywords:reactive evaporation,glancing-angle deposition,isolated-nanocolumnar structures

We simulated reactive evaporation process, in order to investigate the feasibility of fabrication of isolated-nanocolumnar structures with the normal substrate- flux configuration instead of glancing-angle scheme. It was found that virtual glancing-angle deposition may be possible, when the ambient pressure, i.e., the average number of collision is high enough, because the incident angle distribution shifts toward higher angle.