The 76th JSAP Autumn Meeting, 2015

Presentation information

Print

Oral presentation

8 Plasma Electronics » 8.3 deposition of thin film and surface treatment

[16p-2Q-1~13] 8.3 deposition of thin film and surface treatment

Wed. Sep 16, 2015 1:45 PM - 5:00 PM 2Q (231-1)

座長:荻野 明久(静岡大)

2:15 PM - 2:30 PM

△ [16p-2Q-3] Preparation of Ti-DLC and Si-DLC films by reactive HiPIMS with positive and negative pulse bias system

〇Hikaru Kamata1, Takashi Kimura1, Setsuo Nakao2, Tsutomu Sonoda2, Takeshi Kusumori2, Kimihiro Ozaki2, Kingo Azuma3 (1.Nagoya Inst. of Tech., 2.AIST, 3.Univ. of Hyogo)

Keywords:plasma