1:45 PM - 2:00 PM
[16p-4E-1] High precisely wavelength measuring technique for next generation multiple-patterning lithography
Keywords:lithography,ArF laser,wavelength measurement
In semiconductor lithography, light source has to measure and control wavelength high precisely and stably for multiple-patterning refinement. Light source needs to have a wavelength variable function because exposure machine adjusts wavelength to compensate refractive index change caused by the atmospheric pressure. To satisfy these demands we have developed wavelength meter that is able to measure high precisely and extensively wavelength. We will report absolute accuracy and repeatable precision about the wavelength meter.