Transcription of atomic step pattern and surface ultra-flattening on transparent polyimide sheets by thermal nanoimprint process

Kodai Shimada

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[16p-4E-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Sep 16, 2015 1:45 PM - 4:45 PM 4E (437)

座長:山口徹(ＮＴＴ),岡田真(兵庫県立大),柳下崇(首都大)

3:30 PM - 3:45 PM

△ [16p-4E-7] Transcription of atomic step pattern and surface ultra-flattening on transparent polyimide sheets by thermal nanoimprint process

〇Kodai Shimada¹, Geng Tan¹, Yasuhisa Nozawa¹, Tatsuhiro Urakami², Koji Koyama³, Satoru Kaneko^4,1, Akifumi Matsuda¹, Mamoru Yoshimoto¹ (1.Tokyo Inst. of Tech, 2.Mitsui Chemicals, Inc., 3.Namiki Precision Jewel Co.,Ltd., 4.Kanagawa Ind. Tech. Cent.)

Keywords:polyimide,thermal nanoimprint process,atomic step pattern