Oral presentation

3 Optics and Photonics » 3.15 Silicon photonics

[11p-A16-1~11] 3.15 Silicon photonics

Wed. Mar 11, 2015 2:00 PM - 5:00 PM A16 (6A-206)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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2:00 PM - 2:15 PM

[11p-A16-1] Dispersion Control of Silicon Nitride Waveguides

〇Kentaro Furusawa¹, Norihiko Sekine¹, Akifumi Kasamatsu¹ (1.NICT)

2:15 PM - 2:30 PM

△ [11p-A16-2] Low-loss SiN waveguide deposited by ECR-PE CVD method using SiD₄ gas

〇KOTA OKAZAKI^1,², HIDETAKA NISHI^1,², TAI TSUCHIZAWA^1,², TSUYOSHI YAMAMOTO², KOJI YAMADA^1,² (1.NTT Nanophotonics Ctr., 2.NTT Device Technology Labs.)

2:30 PM - 2:45 PM

[11p-A16-3] Optical characteristics in SiON waveguide operated at wavelengths of 405 and 488 nm

〇Rai Kou^1,², Tai Tsuchizawa^1,², Kota Okazaki^1,², Suzuyo Inoue², Yuko Ueno³, Tatsuro Hiraki^1,², Tsuyoshi Yamamoto², Koji Yamada^1,² (1.NTT Nanophotonics Ctr, 2.NTT Device Technology Labs, 3.NTT Basic Research Labs)

2:45 PM - 3:00 PM

[11p-A16-4] Athermal Silicon waveguide using TiO₂ nano-particle polymer cladding

〇Tomohiro Kita¹, Mieko Masaka², Freddy Tan², Hirohito Yamada¹, Daisuke Inoue³, Tatsuya Yamashita³, Manabu Kagami³, Okihiro Sugihara² (1.Tohoku Univ., 2.Utsunomiya Univ., 3.Toyota Central Research Lab.)

3:00 PM - 3:15 PM

[11p-A16-5] a-Si:H-wire waveguides on synthetic quartz glass substrate

〇Makoto Okano¹, Emiko Omoda¹, Yuriko Maegami¹, Yuki Atsumi¹, Youichi Sakakibara¹, Toshihiro Kamei¹, Masahiko Mori¹ (1.AIST)

Break (3:15 PM - 3:30 PM)

3:30 PM - 3:45 PM

[11p-A16-6] Double Tapered Spot-Size Convertor for Polarization-Independent SMF Butt Coupling

〇Hiroyuki Takahashi¹, Hideaki Okayama¹, Hideki Ono¹, Hiroki Yaegashi¹, Hironori Sasaki¹ (1.OKI)

3:45 PM - 4:00 PM

[11p-A16-7] Spot Size Convertors Using Anisotropic Etching of Single-Crystal Silicon

〇Satoshi Miyamura¹, Hideki Ono¹, Yutaka Okabe¹, Yousuke Oonawa¹, Hiroki Yaegashi¹, Tsuyoshi Horikawa^1,², Naoki Hirayama², Hironori Sasaki¹ (1.PETRA, 2.AIST)

4:00 PM - 4:15 PM

[11p-A16-8] Spot-Size Converter with SiO₂ Spacer: Estimation of Spacer Thickness Dependence

〇Yuriko Maegami¹, Makoto Okano¹, Ryohei Takei¹, Emiko Omoda¹, Takeru Amano¹, Masahiko Mori¹, Youichi Sakakibara¹, Toshihiro Kamei¹ (1.AIST)

4:15 PM - 4:30 PM

[11p-A16-9] Design of Optical Isolators utilizing Directional Coupling within Asymmetric Waveguides

〇Masashi Hosoda¹, Jo Sato¹, Abdul Wahid Danish¹, Takaya Hattori¹, Hiromasa Shimizu¹ (1.Tokyo Univ. of Agri. & Tech.)

4:30 PM - 4:45 PM

[11p-A16-10] Design of Si Waveguide Plasmonic Optical Isolators Based on Nonreciprocal Coupling

〇Noboru Fukuda¹, Saori Umetsu¹, Terunori Kaihara¹, Hiromasa Shimizu¹ (1.Tokyo Univ. of Agri. & Tech.)

4:45 PM - 5:00 PM

[11p-A16-11] Silicon Waveguide Optical Isolator Integrated with TE-TM Mode Converter

〇Akihiro Fujie¹, Yuya Shoji¹, Tetsuya Mizumoto¹ (1.Tokyo Inst.)

Session information

[11p-A16-1~11] 3.15 Silicon photonics

[11p-A16-1] Dispersion Control of Silicon Nitride Waveguides

△ [11p-A16-2] Low-loss SiN waveguide deposited by ECR-PE CVD method using SiD₄ gas

[11p-A16-3] Optical characteristics in SiON waveguide operated at wavelengths of 405 and 488 nm

[11p-A16-4] Athermal Silicon waveguide using TiO₂ nano-particle polymer cladding

[11p-A16-5] a-Si:H-wire waveguides on synthetic quartz glass substrate

[11p-A16-6] Double Tapered Spot-Size Convertor for Polarization-Independent SMF Butt Coupling

[11p-A16-7] Spot Size Convertors Using Anisotropic Etching of Single-Crystal Silicon

[11p-A16-8] Spot-Size Converter with SiO₂ Spacer: Estimation of Spacer Thickness Dependence

[11p-A16-9] Design of Optical Isolators utilizing Directional Coupling within Asymmetric Waveguides

[11p-A16-10] Design of Si Waveguide Plasmonic Optical Isolators Based on Nonreciprocal Coupling

[11p-A16-11] Silicon Waveguide Optical Isolator Integrated with TE-TM Mode Converter

Authentication

Session information

[11p-A16-1~11] 3.15 Silicon photonics

△ [11p-A16-2] Low-loss SiN waveguide deposited by ECR-PE CVD method using SiD4 gas

Authentication

△ [11p-A16-2] Low-loss SiN waveguide deposited by ECR-PE CVD method using SiD₄ gas