Oral presentation

7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11p-B2-1~11] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 1:15 PM - 4:30 PM B2 (6B-102)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

+Add all to schedule

1:15 PM - 1:45 PM

[11p-B2-1] [INVITED] Nanoimprint process using condensable gas PFP

〇Hiroshi Hiroshima¹ (1.AIST)

1:45 PM - 2:00 PM

[11p-B2-2] Nano-scale heterogeneity of surface elasticity observed for thin resin films cured by radical photopolymerization

〇(B)Haruna Yano¹, Shoichi Kubo¹, Masaru Nakagawa¹, Xiobin Liang², So Fujinami², Ken Nakajima² (1.IMRAM,Tohoku Univ., 2.WPI-AIMR, Tohoku Univ.)

2:00 PM - 2:15 PM

[11p-B2-3] Rapid growth behavior of microphase-separation structure of PS-b-PMMA for directed self-assembly lithography

〇Nobuya Hiroshiba¹, Ryo Okubo¹, Azusa Hattori², Hidekazu Tanaka², Masaru Nakagawa¹ (1.IMRAM, Tohoku Univ., 2.ISIR, Osaka Univ.)

2:15 PM - 2:30 PM

[11p-B2-4] Formation of randomly-aligned in-plane cylindrical domains of polystyrene-b-polydimethylsiloxane by thermal annealing method (2)

〇Toru Yamaguchi¹, Akira Fujiwara¹ (1.NTT BRL)

Break (2:30 PM - 2:45 PM)

2:45 PM - 3:00 PM

[11p-B2-5] Dependence of demolding force on sidewall slope angle of mold pattern in nanoimprint I

Kimiaki Uemura¹, Kazuo Fujii¹, Marcin Michalowski², 〇(M1C)Takamitsu Tochino¹, Naoto Nakamura¹, Hiroaki Kawata¹, Zygmunt Rymuza², Yoshihiko Hirai¹ (1.Osaka Pref. Univ., 2.Warsaw Univ. of Technology)

3:00 PM - 3:15 PM

△ [11p-B2-6] Dependence of release force on sidewall slope angle of mold pattern in nanoimprint II

〇(M1C)Takamitsu Tochino¹, Kazuo Fujii¹, Marcin Michalowski², Kimiaki Uemura¹, Hiroaki Kawata¹, Zygmunt Rymuza², Yoshihiko Hirai¹ (1.Osaka Pref. Univ., 2.Warsaw Univ. of Technology)

3:15 PM - 3:30 PM

[11p-B2-7] Study of the Resistance of Antisticking Layers against Repeated UV nanoimprint

〇Shuso Iyoshi¹, Makoto Okada¹, Yuichi Haruyama¹, Shinji Matsui¹ (1.Univ. of Hyogo Laboratory of Advanced Science and Technology for Industry)

3:30 PM - 3:45 PM

[11p-B2-8] Nanoimprint-graphoepitaxy for liquid crystalline polymer

〇Makoto Okada¹, Risa Hosoda², Yusuke Taniguchi², Yuichi Haruyama¹, Hiroshi Ono³, Nobuhiro Kawatsuki², Shinji Matsui¹ (1.LASTI, Univ. of Hyogo, 2.Graduate School of Engineering, Univ. of Hyogo, 3.Nagaoka Univ. of Technology)

3:45 PM - 4:00 PM

[11p-B2-9] Control of the amount of UV-curable resin droplets discharged by screen printing for equalizing a residual layer thickness after UV nanoimprinting

〇(M1)Akira Tanabe¹, Uehara Takuya¹, Nagase Kazuro², Ikedo Hiroaki², Hiroshiba Nobuya¹, Nakagawa Masaru¹ (1.IMRAM, Tohoku Univ., 2.Mino Group)

4:00 PM - 4:15 PM

[11p-B2-10] UV nanoimprinting using carbon-coated AAO molds

〇Masaru Nakagawa¹, Akifumi Nakaya¹, Yasuto Hoshikawa¹, Takashi Kyotani¹ (1.IMRAM, Tohoku Univ.)

4:15 PM - 4:30 PM

[11p-B2-11] Nano-object Figuration by UVN-ALD (II) ~Installation of ALD equipment and investigation of Al₂O₃ deposition for resin surface~

〇(B)Shiho Kuroyanagi¹, Nobuya Hiroshiba¹, Masaru Nakagawa¹ (1.IMRAM, Tohoku univ.)

Session information