Session information

Symposium

Symposium » State of the art technology in electron and focused-ion-beam apparatuses

[11p-B3-1~9] State of the art technology in electron and focused-ion-beam apparatuses

Wed. Mar 11, 2015 1:15 PM - 5:15 PM B3 (6B-103)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:15 PM - 1:30 PM

[11p-B3-1] Introductory Talk: Applications of Charged Particle Beams to Industry

〇Gikan Takaoka¹ (1.Kyoto Univ.)

1:30 PM - 2:00 PM

[11p-B3-2] Improvement of SEM's resolution and new technology

〇Ryuichiro Tamochi¹ (1.Hitachi High-Tech)

2:00 PM - 2:30 PM

[11p-B3-3] Introduction of cutting-edge technology in transmission electron microscope

〇Eiji Okunishi¹, Masaki Mukai¹, Yu Jimbo¹, Hidetaka Sawada¹ (1.JEOL Ltd.)

2:30 PM - 3:00 PM

[11p-B3-4] The latest trend in Electron Beam Mask Writer

〇Hidekazu Takekoshi¹, Takashi Kamikubo¹, Shusuke Yoshitake¹, Kenichi Saito¹ (1.NuFlare Technology)

3:00 PM - 3:30 PM

[11p-B3-5] State-of-the-Art Technology of Electron Beam Direct Writing

〇Hiroshi Ozawa¹, Yasuhisa Kuwano¹, Hiromichi Hoshi¹, Tadashi Komagata¹ (1.JEOL Ltd.)

Break (3:30 PM - 3:45 PM)

3:45 PM - 4:15 PM

[11p-B3-6] Latest Topics of Focused Ion Beam (FIB) Technology

〇Tatsuya Asahata¹ (1.Hitachi Hightech)

4:15 PM - 4:45 PM

[11p-B3-7] Helium Ion Microscopy Technology for Characterization and Fabrication

〇Shinichi Ogawa¹ (1.AIST NeRI)

4:45 PM - 5:00 PM

[11p-B3-8] The 3-D nanostructure fabrication by focused-ion-beam, and its refinement

〇Reo Kometani¹ (1.Univ. of Tokyo)

5:00 PM - 5:15 PM

[11p-B3-9] Development of Ionic Liquid Ion Source and its Irradiation Effects on Solid Surface for Metal-Free and Reactive Negative Ion FIB

〇Mitsuaki Takeuchi¹, Yuki Hoshide¹, Hiromichi Ryuto¹, Gikan Takaoka¹ (1.Kyoto Univ.)

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