Oral presentation

6 Thin Films and Surfaces » 6.2 Carbon-based thin films

[12p-C1-1~18] 6.2 Carbon-based thin films

Thu. Mar 12, 2015 1:15 PM - 7:00 PM C1 (6C-104)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:15 PM - 1:30 PM

[12p-C1-1] Formative Elements of Diamondlike Carbon Films Deduced from their Raman Analysis

〇Susumu Takabayashi¹, Meng Yang³, Yuji Takakuwa³, Takayuki Takahagi² (1.RIEC, Tohoku Univ., 2.AdSM, Hiroshima Univ., 3.IMRAM, Tohoku Univ.)

1:30 PM - 1:45 PM

[12p-C1-2] Spectroscopic Analysis of Enhancement of Thermal Stability of Diamondlike Carbon Films

〇Susumu Takabayashi¹, Takayuki Takahagi² (1.RIEC, Tohoku Univ., 2.AdSM, Hiroshima Univ.)

1:45 PM - 2:00 PM

[12p-C1-3] Structures and optical constants of amorphous carbon film deposited by radio-frequency magnetron sputtering

〇Satoru Arakawa¹, Yasuyuki Nakaya¹, X.L. Zhou¹, Sarayut Tunmee¹, Keiji Komatsu¹, Shigeo Ohshio¹, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech.)

2:00 PM - 2:15 PM

▲ [12p-C1-4] The chemical information evaluation of hydrogenated amorphous carbon films by XPS and NEXAFS at different thicknesses

〇(D)Sarayut Tunmee¹, Ratchadaporn Supruangnet², Hideki Nakajima², Xiaolong Zhou¹, Yasuyuki Nakaya¹, Satoru Arakawa¹, Keiji Komatsu¹, Shigeo Ohshio¹, Kazuhiro Kanda³, Hidetoshi Saitoh¹ (1.Nagaoka Univ. Tech., 2.SLRI, 3.LASTI, Univ. of Hyogo)

2:15 PM - 2:30 PM

[12p-C1-5] Technology of low temperature thermal CVD for amorphous carbon film

〇Masayuki Kitamura¹, satoshi Mizunaga¹, Akira Shimizu¹, Akinobu Kakimoto¹, Yoshinobu Hayakawa², Yasuhiro Hamada³ (1.Tokyo Electron Tohoku, 2.Tokyo Electron Miyagi, 3.Tokyo Electron)

2:30 PM - 2:45 PM

△ [12p-C1-6] Characteristics of DLC Films Prepared by Filtered-Arc-Deposition with DC Substrate Bias

〇Yuma Fujii¹, Takahiro Imai¹, Yu Miyamoto¹, Yoshiyuki Suda¹, Hirofumi Takikawa¹, Hideto Tanoue², Masao Kamiya³, Makoto Taki⁴, Yushi Hasegawa⁴, Nobuhiro Tsuji⁴, Satoru Kaneko⁵, Haruyuki Yasui⁶, Shinsuke Kunitsugu⁷, Masahiro Kawaguchi⁸, Kenichi Miura⁹ (1.Toyohashi Univ. of Technol., 2.Kitakyushu National College of Technol., 3.Itoh Opt. Ind. Co., Ltd., 4.Onward Ceramic Coating Co., Ltd., 5.Kanagawa Industrial Technology Center, 6.Industrial Research Institute of Ishikawa, 7.Industrial Technology Center of Okayama Prefecture, 8.Tokyo Metropolitan Industrial Technology Research Institute, 9.Technology Research Institute of Osaka Prefecture)

Break (2:45 PM - 3:00 PM)

3:00 PM - 3:15 PM

▲ [12p-C1-7] Formation of popcorn-like nanostructure in C₆₀-incorporated DLC by exposing to H₂O vapor

〇(DC)Wei Xie¹, Aiko Kawahito¹, Takashi Yanase¹, Taro Nagahama², Toshihiro Shimada² (1.Graduate School of Chemical Sciences and Engineering, Hokkaido University, 2.Hokkaido University)

3:15 PM - 3:30 PM

[12p-C1-8] Generation and evaluation graphene on SiO₂ modulation substrate

〇Tomoki Imamura¹, Takao Izaki¹, Hiroki Nishiguchi¹, Kyota Matsuo¹, Seiya Matsukawa¹, Masao Yoshioka², Hiroshi Kubota^1,² (1.Kumamoto Univ. Graduate School, 2.Kumamoto Univ.)

3:30 PM - 3:45 PM

△ [12p-C1-9] Formation of pentacene-based organic film by hot mesh deposition

〇(M1)shun hirano¹, Akira Heya¹, Naoto Matsuo¹ (1.Univ. of Hyogo)

3:45 PM - 4:00 PM

[12p-C1-10] Thickness Effect on Evaluation of Adhesion of DLC Film by SRV Tribometer

〇Tsuguyori Ohana¹, Hiroki Mano¹, Takako Nakamura¹ (1.AIST)

4:00 PM - 4:15 PM

[12p-C1-11] Surface modification of DLC film by oxygen plasma treatment

〇(B)Yuta Kawachi¹, Yasuharu Ohgoe¹, Akihiko Homma¹, Kenji Hirakuri¹, Tatsuhiko Arafune¹, Hiroo Noguchi¹ (1.Tokyo Denki Univ.)

4:15 PM - 4:30 PM

△ [12p-C1-12] The volume change of Si-containing hydrogenated DLC films by the soft X-ray irradiation

〇Shotaro Tanaka¹, Ryo Imai¹, Makoto Okada¹, Shinji Matsui¹, Kazuhiro Kanda¹ (1.LASTI, Univ. of Hyogo)

Break (4:30 PM - 4:45 PM)

4:45 PM - 5:45 PM

[12p-C1-13] [INVITED] Trends and Future Outlook of DLC Films Technology

〇Naoto Ohtake¹ (1.Tokyo Tech)

5:45 PM - 6:00 PM

[12p-C1-14] Source of N atoms of a-CN_x:H films formed from the microwave discharge flow of the gas mixture of N₂ and CH₃CN

〇(M1)Nobuyoshi Mogi¹, Hiroki Tsudome¹, Haruhiko Ito¹ (1.Nagaoka Univ. of Tech)

6:00 PM - 6:15 PM

△ [12p-C1-15] Influence of Columnar Structures on the Gas Sensitivity of Amorphous Carbon Nitride Thin Films

〇Naoyuki Tamura¹, Masami Aono¹, Nobuaki Kitazawa¹, Yoshihisa Watanabe¹ (1.NDA)

6:15 PM - 6:30 PM

[12p-C1-16] a-CNx:H/Al Films Deposition for Field Emission Using Supermagnetron Plasma

〇Haruhisa Kinoshita¹, Sho Suzuki¹, Ryouhei Taguchi¹, Hiroki Takeuchi¹ (1.Shizuoka Univ., Grad. Sch. Eng.)

6:30 PM - 6:45 PM

△ [12p-C1-17] Synthesis of Graphitic Carbon Nitride Films Using Guanidine Carbonate and the Fundamental Evaluation

〇Shiori Fujita¹, Hitoe Habuchi¹, Shunsaku Takagi¹, Hirofumi Takikawa² (1.Gifu Natl. Coll. Technol., 2.Toyohashi Univ. Technol.)

6:45 PM - 7:00 PM

▲ [12p-C1-18] Large area synthesis of hexagonal boron nitride (hBN) with controlled thickness and crystal shape

〇(D)Subash Sharma¹, Golap Kalita¹, Masaki Tanemura¹ (1.Nagoya Inst of Tech)

Session information

[12p-C1-1~18] 6.2 Carbon-based thin films

[12p-C1-1] Formative Elements of Diamondlike Carbon Films Deduced from their Raman Analysis

[12p-C1-2] Spectroscopic Analysis of Enhancement of Thermal Stability of Diamondlike Carbon Films

[12p-C1-3] Structures and optical constants of amorphous carbon film deposited by radio-frequency magnetron sputtering

▲ [12p-C1-4] The chemical information evaluation of hydrogenated amorphous carbon films by XPS and NEXAFS at different thicknesses

[12p-C1-5] Technology of low temperature thermal CVD for amorphous carbon film

△ [12p-C1-6] Characteristics of DLC Films Prepared by Filtered-Arc-Deposition with DC Substrate Bias

▲ [12p-C1-7] Formation of popcorn-like nanostructure in C₆₀-incorporated DLC by exposing to H₂O vapor

[12p-C1-8] Generation and evaluation graphene on SiO₂ modulation substrate

△ [12p-C1-9] Formation of pentacene-based organic film by hot mesh deposition

[12p-C1-10] Thickness Effect on Evaluation of Adhesion of DLC Film by SRV Tribometer

[12p-C1-11] Surface modification of DLC film by oxygen plasma treatment

△ [12p-C1-12] The volume change of Si-containing hydrogenated DLC films by the soft X-ray irradiation

[12p-C1-13] [INVITED] Trends and Future Outlook of DLC Films Technology

[12p-C1-14] Source of N atoms of a-CN_x:H films formed from the microwave discharge flow of the gas mixture of N₂ and CH₃CN

△ [12p-C1-15] Influence of Columnar Structures on the Gas Sensitivity of Amorphous Carbon Nitride Thin Films

[12p-C1-16] a-CNx:H/Al Films Deposition for Field Emission Using Supermagnetron Plasma

△ [12p-C1-17] Synthesis of Graphitic Carbon Nitride Films Using Guanidine Carbonate and the Fundamental Evaluation

▲ [12p-C1-18] Large area synthesis of hexagonal boron nitride (hBN) with controlled thickness and crystal shape

Authentication

Session information

[12p-C1-1~18] 6.2 Carbon-based thin films

▲ [12p-C1-4] The chemical information evaluation of hydrogenated amorphous carbon films by XPS and NEXAFS at different thicknesses

△ [12p-C1-6] Characteristics of DLC Films Prepared by Filtered-Arc-Deposition with DC Substrate Bias

▲ [12p-C1-7] Formation of popcorn-like nanostructure in C60-incorporated DLC by exposing to H2O vapor

△ [12p-C1-9] Formation of pentacene-based organic film by hot mesh deposition

△ [12p-C1-12] The volume change of Si-containing hydrogenated DLC films by the soft X-ray irradiation

△ [12p-C1-15] Influence of Columnar Structures on the Gas Sensitivity of Amorphous Carbon Nitride Thin Films

△ [12p-C1-17] Synthesis of Graphitic Carbon Nitride Films Using Guanidine Carbonate and the Fundamental Evaluation

▲ [12p-C1-18] Large area synthesis of hexagonal boron nitride (hBN) with controlled thickness and crystal shape

Authentication

▲ [12p-C1-7] Formation of popcorn-like nanostructure in C₆₀-incorporated DLC by exposing to H₂O vapor