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Symposium

Symposium » The latest trend of the lithography technology

[12p-C3-1~4] The latest trend of the lithography technology

Thu. Mar 12, 2015 1:15 PM - 3:30 PM C3 (6C-201)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:15 PM - 2:00 PM

[12p-C3-1] Development of lithography and current status of EUV lithography

〇Shinji Okazaki¹ (1.GPI)

2:00 PM - 2:30 PM

[12p-C3-2] Enabled Scaling in Multiple-patterning

〇Hidetami Yaegashi¹, Kenichi Oyama¹, Shohei Yamauchi¹, Arisa Hara¹, Sakurako Natori¹, Masatoshi Yamato¹, Noriaki Okabe¹, Kyohei Koike¹ (1.Tokyo Electron limited)

2:30 PM - 3:00 PM

[12p-C3-3] Modeling and Optimization of Directed Self-Assembly Process

〇Kenji Yoshimoto¹, Ken Fukawatase¹, Yoshihiro Hori¹, Yusuke Zeniya¹, Masahiro Ohshima¹ (1.Kyoto Univ.)

3:00 PM - 3:30 PM

[12p-C3-4] Nanoimprint systems for high volume semiconductor manufacturing

〇Kazunori Iwamoto¹, Sakai Keita¹, Iwanaga Takehiko¹, Takabayashi Yukio¹ (1.CANON INC.)

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