Session information

Poster presentation

8 Plasma Electronics » 8.4 Plasma etching

[13a-P11-1~2] 8.4 Plasma etching

Fri. Mar 13, 2015 9:30 AM - 11:30 AM P11 (Gymnasium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:30 AM - 11:30 AM

[13a-P11-1] Analyses in subsurface of HfO₂ films etched by CF₄ /Ar /H₂ plasmas.

〇Shunsuke Ohmura¹, Kazuo Takahashi¹ (1.KIT)

9:30 AM - 11:30 AM

[13a-P11-2] Analysis of temperature dependence in Si etching by H plasma -Effect of diffusion of H in bulk and on surface-

〇Kohji Inagaki^1,², Yoshitada Morikawa¹, Kiyoshi Yasutake^1,² (1.Osaka Univ., 2.JST-CREST)

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