Oral presentation

[11p-A27-1~4] 8.2 Plasma measurements and diagnostics

Wed. Mar 11, 2015 2:00 PM - 6:00 PM A27 (6A-202)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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2:00 PM - 2:15 PM

[11p-A27-1] The modeling of neutral beam acceleration mechanism and calculation of waveform of RF applied voltage 2

〇Yasuaki Sakakibara¹, Yoshiyuki Kikuchi^1,², Seiji Samukawa² (1.Tokyo Electron, 2.Tohoku Univ.)

2:15 PM - 2:30 PM

[11p-A27-2] Number density measurement of atomic oxygen by ultra-high sensitive laser absorption spectroscopy using a forbidden line

〇Makoto Matsui¹, Morita Ryo¹ (1.Shizuoka Univ.)

2:30 PM - 2:45 PM

[11p-A27-3] Application of Saturation Spectroscopy to the Electron Density Measurement of Molecular Gas Containing Argon Plasma

〇Shusuke Nishiyama¹, Huimin Wang¹, Koichi Sasaki¹ (1.Hokkaido Univ.)

2:45 PM - 3:00 PM

▲ [11p-A27-4] Spectroscopic Measurement and Number Density Calculation of NO (B, C) excited states in N₂-O₂ mixture microwave discharge

〇(D)HAO TAN¹, Atsushi Nezu¹, Haruaki Matsuura¹, Hiroshi Akatsuka¹ (1.Titech)

Poster presentation

[13a-P10-1~2] 8.2 Plasma measurements and diagnostics

Fri. Mar 13, 2015 9:30 AM - 11:30 AM P10 (Gymnasium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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9:30 AM - 11:30 AM

[13a-P10-1] Time-resolved gas temperature measurement in pulsed-microwave Ar plasma by absorption spectroscopy

〇Kenta Setaka¹, Hirotaka Toyoda^1,² (1.Nagoya Univ., 2.PLANT, Nagoya Univ.)

9:30 AM - 11:30 AM

[13a-P10-2] Measurement of electron temperature using floating probe method

〇Satoshi Noudomi¹, Shuichi Sato¹, Mikio Ohuchi¹ (1.Tokyo Denki Univ.)

Sessions

8 Plasma Electronics » 8.2 Plasma measurements and diagnostics

[11p-A27-1~4] 8.2 Plasma measurements and diagnostics

[11p-A27-1] The modeling of neutral beam acceleration mechanism and calculation of waveform of RF applied voltage 2

[11p-A27-2] Number density measurement of atomic oxygen by ultra-high sensitive laser absorption spectroscopy using a forbidden line

[11p-A27-3] Application of Saturation Spectroscopy to the Electron Density Measurement of Molecular Gas Containing Argon Plasma

▲ [11p-A27-4] Spectroscopic Measurement and Number Density Calculation of NO (B, C) excited states in N₂-O₂ mixture microwave discharge

[13a-P10-1~2] 8.2 Plasma measurements and diagnostics

[13a-P10-1] Time-resolved gas temperature measurement in pulsed-microwave Ar plasma by absorption spectroscopy

[13a-P10-2] Measurement of electron temperature using floating probe method

Authentication

Sessions

8 Plasma Electronics » 8.2 Plasma measurements and diagnostics

[11p-A27-1~4] 8.2 Plasma measurements and diagnostics

[11p-A27-1] The modeling of neutral beam acceleration mechanism and calculation of waveform of RF applied voltage 2

[11p-A27-2] Number density measurement of atomic oxygen by ultra-high sensitive laser absorption spectroscopy using a forbidden line

[11p-A27-3] Application of Saturation Spectroscopy to the Electron Density Measurement of Molecular Gas Containing Argon Plasma

▲ [11p-A27-4] Spectroscopic Measurement and Number Density Calculation of NO (B, C) excited states in N2-O2 mixture microwave discharge

[13a-P10-1~2] 8.2 Plasma measurements and diagnostics

[13a-P10-1] Time-resolved gas temperature measurement in pulsed-microwave Ar plasma by absorption spectroscopy

[13a-P10-2] Measurement of electron temperature using floating probe method

Authentication

▲ [11p-A27-4] Spectroscopic Measurement and Number Density Calculation of NO (B, C) excited states in N₂-O₂ mixture microwave discharge