The 62nd JSAP Spring Meeting, 2015

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13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[11a-A29-1~13] 13.4 Si wafer processing /MEMS/Integration technology

Wed. Mar 11, 2015 9:00 AM - 12:30 PM A29 (6A-204)

9:15 AM - 9:30 AM

[11a-A29-2] Thermal etching of metal thin films in a supercritical CO2 fluid

〇(M1)Yoshiki Nakamura1, Mitsuhiro Watanabe1, Eiichi Kondoh1, Mikhail R. Baklanov2 (1.Univ. Yamanashi, 2.IMEC)

Keywords:supercritical fluid,etching,magnetic thin film