The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 9:00 AM - 11:45 AM B2 (6B-102)

11:30 AM - 11:45 AM

[11a-B2-10] PMMA etching with high selectivity to polystyrene(PS)

〇Kazuma Shimomukai1, Hiroaki Kawata1, Masaaki Yasuda1, Yoshihiko Hirai1 (1.Osaka Pref Univ.)

Keywords:Dry Etching,Pollystyrene,PMMA