The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 9:00 AM - 11:45 AM B2 (6B-102)

11:00 AM - 11:15 AM

△ [11a-B2-8] Exposure Characteristics of New Negativ Electron Beam Polymer Resist with High-Sensitivity

〇Tomohiro Takayama1, Shingo Ikeda1, Kishimura Yukiko1, Hironori Asada1, Naoki Tugawa2, Yosuke Akashika2, Ryoichi Hoshino3 (1.Yamaguchi Univ., 2.NARD Inst., 3.Gluon Lab)

Keywords:Electron Beam Resist