The 62nd JSAP Spring Meeting, 2015

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[11a-B2-1~10] 7.3 Micro/Nano patterning and fabrication

Wed. Mar 11, 2015 9:00 AM - 11:45 AM B2 (6B-102)

11:15 AM - 11:30 AM

△ [11a-B2-9] Dissolution Behavior of PMMA Resist in Development Process

〇Akihiro Konda1, Hiroki Yamamoto1, Masaki Mitsuyasu1, Takahiro Kozawa1, Shusuke Yoshitake2 (1.ISIR Osaka Univ., 2.NuFlare Technology)

Keywords:EUV,lithography,resist