Optimization of optical depth of EUV plasma for lithography

Presentation information

Oral presentation

7 Beam Technology and Nanofabrication » 7.1 X-ray technologies

Wed. Mar 11, 2015 1:15 PM - 5:30 PM A26 (6A-201)

3:45 PM - 4:00 PM

〇tatsuya hosoda¹, hiraku matsukuma¹, kensuke yoshida¹, shinsuke fujioka¹, akifumi yogo¹, hiroaki nishimura¹ (1.Osaka Univ)

Keywords:Extreme ultraviolet