The latest trend in Electron Beam Mask Writer

Presentation information

Symposium

Symposium » State of the art technology in electron and focused-ion-beam apparatuses

Wed. Mar 11, 2015 1:15 PM - 5:15 PM B3 (6B-103)

2:30 PM - 3:00 PM

〇Hidekazu Takekoshi¹, Takashi Kamikubo¹, Shusuke Yoshitake¹, Kenichi Saito¹ (1.NuFlare Technology)

Keywords:Electron Beam Mask Writer,NuFlare Technology,EBM-9000