The 62nd JSAP Spring Meeting, 2015

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Oral presentation

13 Semiconductors » 13.1 Fundamental properties, surface and interface, and simulations ofSi related materials

[12a-A27-1~9] 13.1 Fundamental properties, surface and interface, and simulations ofSi related materials

Thu. Mar 12, 2015 10:00 AM - 12:30 PM A27 (6A-202)

11:00 AM - 11:15 AM

[12a-A27-5] Metal concentration on wafer surface contaminated by pure water

〇MASATO NAKATSU1 (1.Mie Fujitsu Semiconductor)

Keywords:pure water,metal contamination,silicon wafer