The 62nd JSAP Spring Meeting, 2015

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13 Semiconductors » 13.4 Si wafer processing /MEMS/Integration technology

[12a-A29-1~11] 13.4 Si wafer processing /MEMS/Integration technology

Thu. Mar 12, 2015 9:00 AM - 12:00 PM A29 (6A-204)

10:30 AM - 10:45 AM

[12a-A29-6] I-V characteristics of amorphous C12A7 electride/crystalline Si contact

〇Toshinari Watanabe1, Yasuhisa Oana2, Yoshitake Toda3, Naomichi Miyakawa1, Kaoru Furuta2, Hideya Kumomi3, Hideo Hosono3 (1.ASAHI GLASS, 2.LG Display, 3.TITech)

Keywords:Electride,Silicon,Diode