In-situ Monitoring of GaN Film in Process Plasma

Presentation information

Oral presentation

8 Plasma Electronics » 8.0 Plasma Electronics English Session

Thu. Mar 12, 2015 9:00 AM - 10:45 AM D14 (16-503)

9:15 AM - 9:30 AM

〇DAISUKE OGAWA¹, YOSHITAKA NAKANO¹, KEIJI NAKAMURA¹ (1.Chubu University)

Keywords:gallium nitride,etching,plasma-induced damage