[12a-D14-1~7] 8.0 Plasma Electronics English Session

▲ [12a-D14-2] In-situ Monitoring of GaN Film in Process Plasma

〇DAISUKE OGAWA¹, YOSHITAKA NAKANO¹, KEIJI NAKAMURA¹ (1.Chubu University)

キーワード：gallium nitride,etching,plasma-induced damage