[12p-A29-1~11] How should we behave as future scientists? - Innovative value creation of integration technology by young generations -

[12p-A29-10] Property Improvements in Sputter-Deposited MoS₂ Film by Substrate Flattening

〇Takumi Ohashi¹, Shimpei Yamaguchi¹, Kentarou Matsuura¹, Kohei Suda², Seiya Ishihara², Naomi Sawamoto², Kuniyuki Kakushima¹, Nobuyuki Sugii¹, Akira Nishiyama¹, Yoshinori Kataoka¹, Kenji Natori¹, Kazuo Tsutsui¹, Hiroshi Iwai¹, Atsushi Ogura², Hitoshi Wakabayashi¹ (1.Tokyo Tech., 2.Meiji. Univ.)

Keywords:Molybdenum disulfide (MoS2),Sputtering,Thin film transistor