The 62nd JSAP Spring Meeting, 2015

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6 Thin Films and Surfaces » 6.5 Surface Physics, Vacuum

[12p-D13-1~14] 6.5 Surface Physics, Vacuum

Thu. Mar 12, 2015 1:15 PM - 5:00 PM D13 (16-502)

4:15 PM - 4:30 PM

[12p-D13-12] Influence of thermal strain in thermal oxidation processes at SiO2/Si(001) interfaces

〇Shuichi Ogawa1, Jiayi Tang1, Akitaka Yoshigoe2, Shinji Ishidzuka3, Yuden Teraoka2, Yuji Takakuwa1 (1.Tohoku Univ., 2.JAEA, 3.Akita Nat. Col. Tech.)

Keywords:Thermal oxidation process,Unified Si oxidation reaction model,RHEED-AES