[12p-P8-1~14] 13.2 Exploratory Materials, Physical Properties, Devices

[12p-P8-9] Effect of bombarding ion species during fabrication of Er₂O₃ film by means of ion beam sputter deposition

〇masaya fujita^{1, 2}, kenji yamaguchi², hidehito asaoka², wei mao³, takumi chikada⁴, akihiro suzuki³, takayuki terai³ (1.Ibaraki Univ., 2.Japan Atomic Energy Agency, 3.The Univ. of Tokyo, 4.Shizuoka Univ.)

Keywords:sputter etching,ion irradiation,thin film