Development of 400&deg;C operational relaxor ferroelectric based thin-film capacitor with exceptionally high stability

Kumaragurubaran Somu

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

[13a-A21-1~13] 6.1 Ferroelectric thin films

Fri. Mar 13, 2015 9:00 AM - 12:30 PM A21 (6A-213)

11:00 AM - 11:15 AM

▲ [13a-A21-8] Development of 400°C operational relaxor ferroelectric based thin-film capacitor with exceptionally high stability

〇Kumaragurubaran Somu¹, Takahiro Nagata¹, Kenichiro Takahashi^1,², Sung-Gi Ri^1,², Yoshifumi Tsunekawa^1,², Setsu Suzuki^1,², Toyohiro Chikyow¹ (1.NIMS, 2.COMET Inc.)

Keywords:Relaxor,Ferroelectric,Thinfilms

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