[13a-A27-1~13] 8.3 deposition of thin film and surface treatment

△ [13a-A27-10] Effects of ion irradiation on film structures and electronic properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition system

〇Hirotsugu Sugiura¹, Lingyun Jia¹, Da Xu¹, Masayuki Nakamura¹, Hiroki Kondo¹, Kenji Ishikawa¹, Keigo Takeda¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:Amorphous carbon,PECVD