[13a-A27-1~13] 8.3 deposition of thin film and surface treatment

[13a-A27-3] Effect of Substrate Position on the Orientation in Tungsten films during RF Magnetron Sputter Deposition

〇Hirofumi Fujiwara¹, Hiroshi Tsuji¹, Yasuhito Gotoh¹ (1.Kyoto Univ.)

Keywords:sputtering,crystal orientation,substrate position