[13a-P12-1~5] 8.5 nanotechnology.

[13a-P12-4] Effect of Atomic Mass Number of Target Material on Glancing-angle Reactive Sputtering

〇akihiro nakao¹, takashige masukawa¹, yasushi inoue¹, osamu takai² (1.Chibakou Univ, 2.Mater.Surf.Eng.Research Inst,Kanto Gakuin Univ)

Keywords:Reactive Sputtering,Glancing-angle deposition,Atomic Mass Number