Effect of Atomic Mass Number of Target Material on Glancing-angle Reactive Sputtering

Presentation information

Poster presentation

8 Plasma Electronics » 8.5 nanotechnology.

Fri. Mar 13, 2015 9:30 AM - 11:30 AM P12 (Gymnasium)

9:30 AM - 11:30 AM

〇akihiro nakao¹, takashige masukawa¹, yasushi inoue¹, osamu takai² (1.Chibakou Univ, 2.Mater.Surf.Eng.Research Inst,Kanto Gakuin Univ)

Keywords:Reactive Sputtering,Glancing-angle deposition,Atomic Mass Number