[13a-P18-1~22] Joint Session K （Poster）

[13a-P18-21] Plasma treatment for source/drain regions of InGaZnO thin-film transistors ~Effects of source and substrate bias during treatment on resistivity and its thermal stability of IGZO~

〇Yusaku Magari¹, Dapeng Wang^{1, 2}, Mamoru Furuta^{1, 2} (1.Kochi Univ of Tech., 2.Center for Nanotech)

Keywords:TFT,IGZO,Plasma treatment