Retention Characteristics of 50 nm Al<sub>x</sub>O<sub>y</sub> ReRAM Array Before and After Endurance

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices and related techologies

Fri. Mar 13, 2015 4:15 PM - 7:00 PM A23 (6A-216)

6:15 PM - 6:30 PM

〇Hiroki Yamazawa¹, Sheyang Ning^1,², Tomoko Ogura Iwasaki¹, Shuhei Tanakamaru¹, Koh Johguchi¹, Ken Takeuchi¹ (1.Chuo Univ., 2.Univ. of Tokyo)

Keywords:ReRAM,Retention Characteristics