The 62nd JSAP Spring Meeting, 2015

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Oral presentation

8 Plasma Electronics » 8.1 Plasma production and control

[13p-A28-1~10] 8.1 Plasma production and control

Fri. Mar 13, 2015 4:30 PM - 7:00 PM A28 (6A-203)

4:30 PM - 4:45 PM

[13p-A28-1] ECR plasma sputtering apparatus partially substituting waveguides with coaxial cables

〇Housei Akazawa1, Toshiro Ono2 (1.NTT DIC, 2.Hirosaki Univ.)

Keywords:ECR plasma sputtering,waveguide,coaxial cable